Postponed - Date TBD  |  Time: TBA  |  Sinclair Laboratory Auditorium (7 Asa Drive) | Lehigh U.

Speaker bios | About the HS-LEIS, HR-XPS, and AFM systems


One sample will be accepted per company for a free exploratory analysis on the instrument of your choice and the data will be available for discussion during the symposium on June 20, 2013. Contact Dr. Robert Pafchek at pafchek [at] to submit your sample in advance of the symposium.


Speakers to be announced at a later date.


High Sensitivity Low Energy Ion Scattering (HS-LEIS) Spectroscopy

The only system of its kind in America, the new Qtac 100 High Sensitivity-Low Energy Ion Scattering (HS-LEIS) spectrometer system, complete with in situ pretreatment chambers, was recently installed at Lehigh University. This new machine utilizes a unique double toroidal electrostatic energy analyzer that provides 3,000 times higher sensitivity than conventional ion scattering spectrometers. Coupled with the existing Scienta ESCA-300 High Resolution-X-ray Photoelectron Spectrometer (HR-XPS) system, Lehigh University possesses unique and sophisticated surface characterization opportunities.

The Qtac100 is the new generation of LEIS instruments. It has been developed to include small spot analysis, surface imaging, and static and dynamic depth profiling, as well as 3000 times higher sensitivy than conventional LEIS instruments. This instrument provides the best quantitative look at the top atomic layer of materials.

For more information on HS-LEIS click here.

NIM Section B, 1992, 68, p207

High Resolution X-ray Photoelectron Spectroscopy (HR-XPS)

The Scienta ESCA 300 is generally regarded as one of the best XPS instruments in operation today. The sample chamber and/or attached chambers provide the ability to heat specimens to >1000°C without the use of electron bombardment, expose surfaces to various vacuum compatible reactant gases, deposit thin films from a precision Knudsen cell and monitor the thickness with a crystal monitor, monitor the vacuum with an RGA, fracture brittle samples in situ, sputter clean surfaces, and scrape surfaces in UHV. The sample entry chamber, which can have base pressures in the low 10 -8 torr range, can be used to carry out experiments at temperatures >400°C at pressures ranging from 10 -8 to 700 torr.

Atomic Force Microscopy (AFM)

In addition to standard surface topology, the electrical and magnetic properties can also be detailed with respect to a materialís surface with the NT-MDT Solver NEXT.