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Quantitative X-ray Microanalysis: Problem Solving using EDS and WDS Techniques

June 8-12, 2009
Cost: $2,850

This course is for SEM and microprobe operators and supervisors who wish to further advance their knowledge of x-ray microanalysis. Emphasis will be placed on the physical concepts and practical details required for successful quantitative analysis. Learn how to perform EDS and WDS microanalysis on bulk specimens, layered materials, particles and beam-sensitive materials. Master quantitative aspects including ZAF and Φ(ρz) corrections. Discover emerging technologies such as silicon drift detectors, micro calorimeter EDS, and microanalysis in a variable pressure SEM. Computer-aided imaging and microanalysis will be introduced with special emphasis placed on the accuracy and reliability of automated analysis.

Course Outline MS Word Format | PDF Format

Course Lecturers
John Armstrong, Paul Carpenter, Dan Kremser, Eric Lifshin, and Dale Newbury

Course Literature/Textbooks
Each registrant receives the textbook, Electron Probe Quantitation, Kluwer/Springer Publishers (1991), as well as detailed laboratory notes which provide experimental results and worked problems. The book and the notes are authored by the lecturers of the course. In addition, everyone receives additional notes for specific lecturers, a list of vendors and equipment suppliers, and the Lehigh CD-ROM.