Mechanical Nanocharacterization

An atomic force microscope (AFM) is available for in situ nanoscale surface imaging in air or under desired solution. This device can operate in contact or tapping mode, with electrochemical stages for control of reactions and temperatures up to 150 C. A Hysitron Triboscope Nanoindentation attachment allows measurement of elasticity and plasticity from 25 to 150 C, with indentations as shallow as 20 nm. Nano-wear measurements are also possible.

Nanocharacterization in the Nanomechanical Behavior Laboratory Back to Top
	Scanning Probe Microscopy Digital Instruments (DI) Nanoscope III Surface imaging in air or in solution Contact (AFM) or Tapping Mode Electrochemical stages
Contact and tapping modes, and electrochemical stages for control of reactions in-situ. Imaging may be performed in air or under desired solution. A Hysitron Triboscope Nanoindentation attachment allows surface imaging and indentation, and measurement of elastic and plastic properties, with indentation of 20 nm. Forces on order of mN to mN may be applied. Temperature control up to 150°C.

AFM Imaging of Nanostructures	Back to Top
AFM image of PTFE lines drawn out by the friction transfer technique onto a glass slide.
STM image of self-assembled Au nanoparticles on highly ordered pyrolytic graphite

Nano Indentation Back to Top

To analyze plastic deformation mechanisms in nanocrystalline materials at very low-load and identify microstructural influences during shallow (only 3-30 nm) indentation. Results are applicable to interpretation of nanoindentation tests and to nano-asperity contact of surfaces in nanomechanical devices.

Nano Indentation of a Platinum thin film with the Hysitron Triboscope (150 nm "diameter", 14 nm depth)

Thin Film Creep Studies Back to Top
Analyze, model, and control stress relaxation / dimensional stability for nm-scale metal films by applying a new resonance based measurement technique with unprecedented sensitivity.	Thin Film Creep Measurement by Membrane Resonance. Operates up to 500 °C, with film thickness of 20-100 nm, stress resolution typically < 1 MPa