Quantitative X-ray Microanalysis:
Problem Solving using EDS and WDS Techniques

Bring a specimen and solve a microanalysis problem!

June 5-9, 2017

Cost: $3,450

Course Description

Discover how to get the highest quality results for a wide variety of materials doing analysis and x-ray mapping with silicon drift detectors, Si(Li) EDS, and WDS. Master problem solving and quantitative analysis using advanced software tools. Learn how to get the best analytical resolution by working at low voltages. Get new tips on how to deal with ‘pernicious’ samples like beam-sensitive materials, particles, surface layers, and rough surfaces. Learn the best ways to analyze light and trace elements, handling bad peak overlaps. Become a better analyst with increased skills and improve those job credentials.

Course Lecturers

John Armstrong, Emma Bullock, Paul Carpenter, Eric Lifshin, Bill Mushock, Nicholas Ritchie

Course Outline (PDF)

Course Literature/Textbooks

Each registrant receives the textbook, Electron Microprobe Analysis, 2nd edition, SJB Reed, Cambridge University Press (1997), as well as detailed laboratory notes which provide experimental results and worked problems. The book and the notes are authored by the lecturers of the course. In addition, everyone receives additional notes for specific lecturers, a list of vendors and equipment suppliers, and a link to a website containing exclusive imaging and analysis software.