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Problem Solving with SEM, X-Ray Microanalysis,
and Backscatter Patterns

June 9-13, 2008
Cost: $2,750

For scientists, engineers, technicians, and technical managers who seek an intermediate/advanced course in the techniques of SEM, x-ray microanalysis, and electron backscatter diffraction (EBSD) applied to practical problem solving. High- resolution SEM, low-voltage SEM, variable-pressure SEM (environmental), crystallography by EBSD, x-ray spectrometry by EDS, silicon drift detectors (SDD) and WDS, digital image processing, and image/microanalysis modeling will be described in lectures and laboratories.

BRING A SPECIMEN–SOLVE A PROBLEM! Students are encouraged to bring their own specimens and/or data such as SEM images (e.g., JPEG, TIFF formats), EDS x-ray spectra (export as MSA/MAS format), EBSD patterns, etc. These will be examined in small group laboratory sessions with problem solving discussions led by lecturers and laboratory demonstrators from the participating vendors. Software will be provided ( Monte Carlo simulation, image processing, electron/x-ray database).

Course Outline MS Word Format | PDF Format

Course Lecturers
Arlan Benscoter, Alwyn Eades, John Hunt, David Joy, Joe Michael, Dale Newbury, and Bill Thompson

Course Literature/Textbooks
Each registrant receives the textbook, Scanning Electron Microscopy and X-ray Microanalysis, 3rd edition, Kluwer/Springer Publishers (2003), as well as detailed laboratory notes which provide experimental results and worked problems. The book and the notes are authored by the lecturers of the course. In addition, everyone receives additional notes for specific lecturers, a list of vendors and equipment suppliers, and the Lehigh CD-ROM.